000 | 03035nam a22004815i 4500 | ||
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001 | 978-3-642-04830-2 | ||
003 | DE-He213 | ||
005 | 20140220084527.0 | ||
007 | cr nn 008mamaa | ||
008 | 100623s2010 gw | s |||| 0|eng d | ||
020 |
_a9783642048302 _9978-3-642-04830-2 |
||
024 | 7 |
_a10.1007/978-3-642-04830-2 _2doi |
|
050 | 4 | _aQD901-999 | |
072 | 7 |
_aPHFC _2bicssc |
|
072 | 7 |
_aSCI016000 _2bisacsh |
|
082 | 0 | 4 |
_a548 _223 |
100 | 1 |
_aEhrentraut, Dirk. _eeditor. |
|
245 | 1 | 0 |
_aTechnology of Gallium Nitride Crystal Growth _h[electronic resource] / _cedited by Dirk Ehrentraut, Elke Meissner, Michal Bockowski. |
264 | 1 |
_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg, _c2010. |
|
300 |
_aXX, 334p. 400 illus., 200 illus. in color. _bonline resource. |
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336 |
_atext _btxt _2rdacontent |
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337 |
_acomputer _bc _2rdamedia |
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338 |
_aonline resource _bcr _2rdacarrier |
||
347 |
_atext file _bPDF _2rda |
||
490 | 1 |
_aSpringer Series in Materials Science, _x0933-033X ; _v133 |
|
505 | 0 | _aMarket for Bulk GaN Crystals -- Development of the Bulk GaN Substrate Market -- Vapor Phase Growth Technology -- Hydride Vapor Phase Epitaxy of GaN -- Growth of Bulk GaN Crystals by HVPE on Single Crystalline GaN Seeds -- Freestanding GaN Wafers by Hydride Vapor Phase Epitaxy Using Void-Assisted Separation Technology -- Nonpolar and Semipolar GaN Growth by HVPE -- High Growth Rate MOVPE -- Solution Growth Technology -- Ammonothermal Growth of GaN Under Ammono-Basic Conditions -- A Pathway Toward Bulk Growth of GaN by the Ammonothermal Method -- Acidic Ammonothermal Growth Technology for GaN -- Flux Growth Technology -- High Pressure Solution Growth of Gallium Nitride -- A Brief Review on the Na-Flux Method Toward Growth of Large-Size GaN Crystal -- Low Pressure Solution Growth of Gallium Nitride -- Characterization of GaN Crystals -- Optical Properties of GaN Substrates -- Point Defects and Impurities in Bulk GaN Studied by Positron Annihilation Spectroscopy. | |
520 | _aThis book deals with the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production. Leading experts from industry and academia report in a very comprehensive way on the current state-of-the-art of the growth technologies and optical and structural properties of the GaN crystals are compared. | ||
650 | 0 | _aPhysics. | |
650 | 0 | _aCrystallography. | |
650 | 0 | _aOptical materials. | |
650 | 1 | 4 | _aPhysics. |
650 | 2 | 4 | _aCrystallography. |
650 | 2 | 4 | _aOptical and Electronic Materials. |
700 | 1 |
_aMeissner, Elke. _eeditor. |
|
700 | 1 |
_aBockowski, Michal. _eeditor. |
|
710 | 2 | _aSpringerLink (Online service) | |
773 | 0 | _tSpringer eBooks | |
776 | 0 | 8 |
_iPrinted edition: _z9783642048289 |
830 | 0 |
_aSpringer Series in Materials Science, _x0933-033X ; _v133 |
|
856 | 4 | 0 | _uhttp://dx.doi.org/10.1007/978-3-642-04830-2 |
912 | _aZDB-2-PHA | ||
999 |
_c111648 _d111648 |