000 | 04384nam a22005535i 4500 | ||
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001 | 978-1-4614-1812-2 | ||
003 | DE-He213 | ||
005 | 20140220083243.0 | ||
007 | cr nn 008mamaa | ||
008 | 111129s2012 xxu| s |||| 0|eng d | ||
020 |
_a9781461418122 _9978-1-4614-1812-2 |
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024 | 7 |
_a10.1007/978-1-4614-1812-2 _2doi |
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050 | 4 | _aTK7800-8360 | |
050 | 4 | _aTK7874-7874.9 | |
072 | 7 |
_aTJF _2bicssc |
|
072 | 7 |
_aTEC008000 _2bisacsh |
|
072 | 7 |
_aTEC008070 _2bisacsh |
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082 | 0 | 4 |
_a621.381 _223 |
100 | 1 |
_aHe, Ming. _eauthor. |
|
245 | 1 | 0 |
_aMetal-Dielectric Interfaces in Gigascale Electronics _h[electronic resource] : _bThermal and Electrical Stability / _cby Ming He, Toh-Ming Lu. |
264 | 1 |
_aNew York, NY : _bSpringer New York, _c2012. |
|
300 |
_aXI, 149p. 120 illus., 48 illus. in color. _bonline resource. |
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336 |
_atext _btxt _2rdacontent |
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337 |
_acomputer _bc _2rdamedia |
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338 |
_aonline resource _bcr _2rdacarrier |
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347 |
_atext file _bPDF _2rda |
||
490 | 1 |
_aSpringer Series in Materials Science, _x0933-033X ; _v157 |
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505 | 0 | _aPreface -- 1. Introduction -- 2. Metal-Dielectric Diffusion Processes: Fundamentals -- 3. Experimental Techniques -- 4. Al-Dielectric Interfaces -- 5. Cu-Dielectric Interfaces -- 6. Barrier Metal-Dielectric Interfaces -- 7. Self-Forming Barriers. 8. Kinetics of Ion Drift -- 9. Time-Dependent Dielectric Breakdown (TDDB) and Future Directions. | |
520 | _aMetal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate interface phenomena and the principles that govern them. Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material presented here will also be of interest to those engaged in field-effect transistor and memristor device research, as well as university researchers and industrial scientists working in the areas of electronic materials processing, semiconductor manufacturing, memory chips, and IC design. Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces Features fundamental considerations in the physics and chemistry of metal-dielectric interactions Explores mechanisms of metal atom diffusion and metal ion drift in dielectrics Provides keys to understanding reliability in gigascale electronics Focuses on a dynamic area of current research that is a foundation of future interconnect systems, memristors, and solid-state electrolyte devices Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces | ||
650 | 0 | _aEngineering. | |
650 | 0 | _aChemistry. | |
650 | 0 | _aElectronics. | |
650 | 0 | _aOptical materials. | |
650 | 1 | 4 | _aEngineering. |
650 | 2 | 4 | _aElectronics and Microelectronics, Instrumentation. |
650 | 2 | 4 | _aOptical and Electronic Materials. |
650 | 2 | 4 | _aSurface and Interface Science, Thin Films. |
650 | 2 | 4 | _aNanotechnology and Microengineering. |
650 | 2 | 4 | _aElectrochemistry. |
650 | 2 | 4 | _aEngineering Thermodynamics, Heat and Mass Transfer. |
700 | 1 |
_aLu, Toh-Ming. _eauthor. |
|
710 | 2 | _aSpringerLink (Online service) | |
773 | 0 | _tSpringer eBooks | |
776 | 0 | 8 |
_iPrinted edition: _z9781461418115 |
830 | 0 |
_aSpringer Series in Materials Science, _x0933-033X ; _v157 |
|
856 | 4 | 0 | _uhttp://dx.doi.org/10.1007/978-1-4614-1812-2 |
912 | _aZDB-2-PHA | ||
999 |
_c101137 _d101137 |